Metal patterns printed on a III-V semiconductor material can control the appearance and positions of droplets arising on its surface when heated. The result is a significant step forward for controlled device fabrication on a chip.
Metal patterns printed on a III-V semiconductor material can control the appearance and positions of droplets arising on its surface when heated. The result is a significant step forward for controlled device fabrication on a chip.
November 1 marks one year since ForMAX beamline officially opened for user experiments. Congratulations to ForMAX and everyone involved in making ForMAX possible! It has been one exciting first year.