| X-ray source (IVU) | In-vacuum undulator, 18 mm period, 4.2 mm minimal gap, 2 m magnetic length |
| Energy (wavelength) range | 5 - 25 keV (0.5 - 2.5 Å) using 3rd - 11th harmonic of the IVU |
| Monochromator (HDCM) | At 26 m, Si (111), double crystal monochromator, horizontally deflecting, LN2 side-cooling |
| Energy bandwidth | 2 x 10-4 ΔE/E |
| Focusing optics | Kirkpatrick-Baez (KB) mirror pair (VFM, HFM) |
| Vertical focusing mirror (VFM) | At 31.5 m, 3 mrad grazing incidence angle Flat substrate bent to an elliptical cylinder: 0.148 μrad RMS slope error over 200 mm, 0.18 μrad RMS slope error over 350 mm |
| Horizontal focusing mirror (HFM) | At 32.1 m, 3 mrad grazing incidence angle Flat substrate bent to a circular cylinder: 0.14 μrad RMS slope error over 250 mm |
| Harmonic rejection | VFM and HFM with Si/Rh/Pt stripes |
| Beam size at sample position (37 m) | 20 x 5 μm2 (FWHM, horizontal x vertical), larger beam by defocusing or using unfocused beam |
| Divergence at sample | 0.1 x 0.1 mrad2 (FWHM) |
| Flux at sample (focused) at 1 Å | 2 x 1013 ph/s (through 20 x 5 μm2 pinhole) |